The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 08, 2000
Filed:
Jun. 26, 1997
Sony Corporation, Tokyo, JP;
Abstract
A DC sputtering system improved in prevention of fusion of a substrate and electric corrosion of a pallet revolving shaft due to the flow of negative electric charges at the time of production of an optical disk. The system includes a pair of electrodes, a negative electrode and a positive electrode, wherein the negative electrode is composed of a target plate made from a target material such as Si and a backing plate on which the target plate is fixedly placed, and the positive electrode is composed of a pallet disposed opposite to the negative electrode. A substrate of an optical disk is mounted on the positive electrode side through a disk base using an inner peripheral mask and an outer peripheral mask. Each of the inner peripheral mask and the outer peripheral mask is made from or covered with an electrically insulating material such as teflon or ceramic. This prevents the flow of negative electric chargers from being concentrated at the inner peripheral mask and the outer peripheral mask, to thereby protect the substrate from being fused.