The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 08, 2000
Filed:
Aug. 06, 1996
Masahiko Fujii, Ebina, JP;
Fuji Xerox Co., Ltd., Tokyo, JP;
Abstract
A polycrystalline silicon layer which serves as a heating resistor is laid on a Si substrate, whereby a heating area 25 and a low-resistance area 26 are formed. In this event, the area of the heating area 25 is set according to the physical properties of ink squirted from a corresponding nozzle. As a result, the amount of ink droplet to be squirted becomes an optimum value, and the quality of an image is improved. Further, the heating area 25 is formed such that the resistance of the heating area becomes larger as the area of the heating area becomes smaller. Eventually, the amounts of energy per unit area of the heating areas become equal to each other, and ink-jet nozzles can be actuated using the same drive pulse.