The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 01, 2000

Filed:

Nov. 21, 1997
Applicant:
Inventor:

Josef Robert Unternahrer, Niskayuna, NY (US);

Assignee:

General Electric Company, Schenectady, NY (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01S / ;
U.S. Cl.
CPC ...
372108 ;
Abstract

A method for laser shock peening a target surface generates laser pulses from a cavity dumping oscillator having an optically-pumped laser and directs the pulses against the target. A first technique uses pulses having rectangular cross section. A second technique passes each generated pulse two or more times through the same optical amplifier before directing the pulse against the target. A third technique drives the laser with a time pulse of electric current having a rectangular shape. A reflective laser beam homogenizer uses two abutting mirrors to split a laser beam into two equal halves and then uses an odd number of additional mirrors to reflect each half first behind and then to the opposite one of the two mirrors to be reflected back as a beam having interchanged halves.


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