The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 01, 2000
Filed:
Aug. 03, 1998
Shrenik Deliwala, Brighton, MA (US);
Allen Flusberg, Newton, MA (US);
Science Research Laboratory, Inc., Somerville, MA (US);
Abstract
An ultra high resolution wave focusing method and apparatus is disclosed. The invention provides a focusing system having an effective numerical aperture greater than that possible using known conventional focusing techniques. By the method and apparatus of the invention, a wave of arbitrary wavefront profile and wavelength .lambda. is focused to a region of high amplitude having a spot size that approaches the fundamental limit of 0.25.lambda.. Imaging and patterning systems employing such a wave focusing method and apparatus provide ultra high resolution and ultra small feature sizes beyond the capabilities of systems utilizing conventional focusing elements.