The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 01, 2000
Filed:
Mar. 06, 1998
Applicant:
Inventors:
Michael Lester Wise, Poughkeepsie, NY (US);
Jeremy Kaspar Stephens, Wappingers Falls, NY (US);
Suri G Hedge, Hollowville, NY (US);
Assignees:
Siemens Aktiengesellschaft, Munich, DE;
International Business Machines Corp., Armonk, NY (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
438691 ; 438692 ; 438693 ;
Abstract
Areas of different temperatures are provided on a semiconductor wafer to improve uniformity in polishing rates during CMP.
Quick Actions:
Wise, Michael. (2000). Methods and apparatus for chemical mechanical planarization (cmp) of a (U.S. Patent No. 6020262). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6020262
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile