The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 01, 2000
Filed:
May. 17, 1999
Applicant:
Inventors:
Daniel A Foucher, Toronto, CA;
Nancy C Stoffel, Rochester, NY (US);
Roger T Janezic, Rochester, NY (US);
Thomas W Smith, Penfield, NY (US);
David J Luca, Rochester, NY (US);
Bidan Zhang, Beacon, NY (US);
Assignee:
Xerox Corporation, Stamford, CT (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ; C08G / ; H01R / ;
U.S. Cl.
CPC ...
430627 ; 528125 ; 528126 ; 528127 ; 528128 ; 528171 ; 528174 ; 528176 ; 528185 ; 528190 ; 528191 ; 528196 ; 528373 ; 528391 ; 528423 ; 522-5 ; 522 71 ; 522165 ; 522167 ; 525390 ; 525437 ; 525471 ; 525534 ; 525535 ; 525536 ; 525540 ; 298901 ; 524 81 ; 524167 ; 524284 ; 524745 ; 524765 ;
Abstract
Disclosed is a process which comprises reacting a polymer of the general formula ##STR1## or ##STR2## wherein x is an integer of 0 or 1, A is one of several specified groups, such as ##STR3## B is one of several specified groups, such as or mixtures thereof, and n is an integer representing the number of repeating monomer units, with a halomethylethyl ether, a hydrohalic acid, and acetic acid in the presence of a halogen-containing Lewis acid catalyst, thereby forming a halomethylated polymer.