The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 25, 2000

Filed:

Apr. 12, 1996
Applicant:
Inventor:

Toshio Kamei, Tokyo, JP;

Assignee:

NEC Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06K / ;
U.S. Cl.
CPC ...
382125 ; 382195 ;
Abstract

A skin pattern image is filtered by convolution calculation on a real plane or product calculation on a Fourier transformed plane with each of two-dimensional filters prepared according to kinds of features to be extracted of the skin pattern image. Image intensity of each subregion of each filtered data is calculated. Feature of each subregion is represented by a feature parameter corresponding to a filter that gives a highest value of the image intensity of the subregion. An initial pattern of features thus obtained is smoothed to minimize an evaluation function. A filtered skin pattern image having pixel values of each subregion smoothed by a set of filters prepared for extracting a kind of features is further filtered by another set of filters for extracting another kind of features.


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