The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 25, 2000
Filed:
Feb. 19, 1999
Ronald E Chambers, Houston, TX (US);
Baker Hughes Incorporated, Houston, TX (US);
Abstract
A conventional CMP gather is Radon transformed from t-x space to the .tau.-p domain. The Radon-transformed data are windowed or zoned into a plurality of data sets, each having an common independent range of selected characteristics. All except one data set are muted. The zero ordinate of the p-axis is shifted to become centered through the contents of the retained data set which is then inverse-transformed back to t-x space. The process is repeated for each of the remaining windowed data sets. The processed windowed data sets are summed.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile