The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 25, 2000
Filed:
Jul. 18, 1997
Yoshiyuki Tsuzawa, Kanagawa, JP;
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Abstract
A paper mask device can alternatively hold a first paper mask or a second paper mask. The first paper mask has a mask aperture to which a lith film with appropriate lettering is attached. The second paper mask has a mask aperture for making an index print composed of a plurality of index frames. The paper mask device can hold a lamp box for illuminating the lith film when the first paper mask is held in the paper mask device. The paper mask device holds the paper mask so as to be pivotal about an axis that is disposed in a center of a leading end of the paper mask in the mask inserting direction, so that inclination of the mask aperture is adjustable through a positioning device which holds opposite side edges of a trailing end portion of the paper mask in the masking position.