The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 25, 2000
Filed:
Dec. 08, 1998
Applicant:
Inventors:
Jean F Depatie, Albion, NY (US);
Teresa C Mayer, Rochester, NY (US);
Robert A Bovenzi, Rochester, NY (US);
Martin P Farcella, Rochester, NY (US);
Assignee:
Eastman Kodak Company, Rochester, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B / ; H02K / ; H02K / ; H02K / ;
U.S. Cl.
CPC ...
396463 ; 310 89 ; 310 91 ; 310156 ; 310261 ;
Abstract
An aperture/shutter system defining an optical path comprises a shutter mechanism operable at a first state to selectively block light along the optical path and a second state to allow light along the optical path; and a motor including a stator and an annular rotor. The rotor is rotably supported within the stator by a support that is (i) stationary with respect to the stator and (ii) engages an inner surface of the rotor. The rotor is coupled to the shutter mechanism to move the shutter mechanism between the first state and the second state.