The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 25, 2000
Filed:
May. 21, 1996
Frank Knoll, Huntington Station, NY (US);
Norman R Wieder, Commack, NY (US);
Jeffrey F Walsh, Central Islip, NY (US);
East/West Industries, Inc., Ronkonkoma, NY (US);
Abstract
An aqueous cleaning system and process for cleaning critical application gas systems and components, critical application fluid systems, and cryogenic systems. The aqueous cleaning system comprises multiple cleaning and rinsing stations, and a water purification and recycling system to implement a multi-step aqueous cleaning process. The multi-step aqueous cleaning process includes a pre-cleaning step, a rinsing step, a final cleaning step, and a final rinsing step. The rinsing step includes primary and secondary rinsing stages. The aqueous cleaning system is portable and self-contained and the aqueous cleaning process may be utilized in batch or lot type cleaning as well as in situ system level cleaning.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile