Fabrication method for semiconductor substrate

Abstract

A scroll compressor includes a scroll set in which fluids at various operating pressures impart a plurality of forces on the scroll set orbiting and fixed scroll members. An axial biasing force is applied against the orbiting scroll member urging same toward the fixed scroll member. Fluid at discharge pressure exerts an axial force at a first area of the back surface of the orbiting scroll member which urges the orbiting scroll member toward the fixed scroll member to maintain axial compliance therebetween and to prevent leakage of compressed refrigerant fluid during compressor operation. An axial anti-biasing force is applied between the orbiting and fixed scroll members to urge them apart. An annular chamber provided between the end plates of the orbiting and fixed scroll members forms a cavity that is in communication with fluid contained in pockets of compression in the scroll set. The fluid in the pockets of compression is at a pressure intermediate discharge and suction pressures. A passage provided in the scroll set communicates the intermediate pressure fluid from the pockets of compression to the intermediate pressure cavity. The intermediate pressure fluid acts upon the opposing face surfaces of the orbiting and fixed scroll members urging them apart. In this manner, an unbiasing force is exerted between the scroll members to offset excessive axial biasing forces which may act upon the orbiting scroll member, thereby preventing excessive wear and power consumption and providing enhanced operating efficiency. The intermediate force effectively acts as a cushion to lessen the biasing force at the higher end of the operating range.