The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 11, 2000
Filed:
Dec. 28, 1995
Yuhei Sumiyoshi, Utsunomiya, JP;
Koji Mikami, Utsunomiya, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A projection exposure apparatus usable with a reticle having a pattern and a wafer onto which the pattern of the reticle is transferred. The apparatus includes an illumination system for illuminating the reticle, a projection optical system for projecting the pattern of the reticle onto the wafer, wherein the projection optical system includes two lens groups which are individually movable along an optical axis direction, but are not juxtaposed with each other, and a controller for simultaneously adjusting distortion and projection magnification of the pattern projected onto the wafer. The controller performs the adjustment such that the two lens groups of the projection optical system are moved separately along the optical axis direction.