The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 11, 2000
Filed:
Apr. 26, 1996
James R Webb, Boulder, CO (US);
Ron C Simpson, Erie, CO (US);
Display Laboratories, Inc., Boulder, CO (US);
Abstract
A system for generating correction factor data that is representative of the distortion characteristics of a cathode ray tube. The correction factor data is stored with a cathode ray tube to allow later alignment of a video signal, or can be provided on a storage medium or on a network. Distortion data, and resultant correction factor data is generated for a series of discrete physical locations on the cathode ray tube screen. In this manner, the entire screen surface can be utilized to align a video image. Maximum correctable distortion data is also generated in accordance with the present invention to provide exit criteria for cathode ray tube manufacturers. The exit criteria is based upon maximum correction factor data that can be generated to correct distortions. A characterization module is provided that can be coupled to cathode ray tube coils that stores the correction factor data or an identification number for the cathode ray tube that can be used to retrieve the correction factor data from any desired source such as CD ROMS, a LAN, a database coupled to a WAN, or the Internet, etc. Interpolation techniques can be used to generate correction factor data for any desired number of interpolation points based upon correction factor data provided for a lesser number of characterization locations.