The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 11, 2000
Filed:
Dec. 21, 1998
Robert Harold Krahnke, Midland, MI (US);
Timothy B Lueder, Mt. Pleasant, MI (US);
Richard Alan Palmer, Midland, MI (US);
Nick Evan Shephard, Midland, MI (US);
Dow Corning Corporation, Midland, MI (US);
Abstract
An organosilicon compound comprising one aliphatic unsaturation described by formula ##STR1## where each R.sup.1 is an independently selected hydrocarbon radical free from aliphatic unsaturation comprising 1 to about 18 carbon atoms; each R.sup.2 is an independently selected hydrocarbon radical free from aliphatic unsaturation comprising 1 to about 18 carbon atoms; each X is independently selected from the group consisting of halogen, alkoxy, acyloxy, and ketoximo; t is 2 or 3; n is 0, 1, or 2; u is 0 or 1; each Z is independently selected from the group consisting of divalent hydrocarbon radicals free of aliphatic unsaturation comprising about 2 to 18 carbon atoms and a combination of divalent hydrocarbon radicals and siloxane segments; and Y is selected from the group consisting of hydrocarbon radicals comprising one aliphatic unsaturation and 2 to about 18 carbon atoms and a combination of hydrocarbon radicals, siloxane segments, and a divalent hydrocarbon radical free of aliphatic unsaturation comprising about 2 to 18 carbon atoms. The organosilicon compounds comprising one aliphatic unsaturation of the present invention are useful as endcappers for polymers.