The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 11, 2000
Filed:
Nov. 26, 1997
Applicant:
Inventor:
Akira Kamisawa, Ukyo-ku, JP;
Assignee:
Rohm Co. Ltd., Kyoto, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ; B05D / ;
U.S. Cl.
CPC ...
427551 ; 427553 ; 427554 ; 427557 ; 427558 ; 427226 ; 4271263 ;
Abstract
The present invention provides a method for forming a thicker thin film of complex compound easily without causing cracks in the film. Sol solution is coated and dehydrated on an upper surface of a substrate by sol-gel method (step S1, S2). A thin film formed on the upper surface of the substrate is exposed by radiation which has predetermined energy (step S3). Thus, the thin film of complex compound is polymerized, cracks are not caused even in forming a thicker thin film.