The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 04, 2000

Filed:

Mar. 07, 1997
Applicant:
Inventors:

Takashi Monoi, Oita, JP;

Masakazu Yamamoto, Oita, JP;

Hidenobu Torigoe, Oita, JP;

Yoshimitsu Ishihara, Oita, JP;

Shintaro Inazawa, Oita, JP;

Assignee:

Showa Denko K.K., Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08F / ;
U.S. Cl.
CPC ...
526127 ; 526153 ; 526160 ; 526161 ; 526169 ; 526172 ; 526352 ; 526132 ; 526134 ;
Abstract

A process for the production of ethylenic polymers is disclosed in which an ethylenic monomer is polymerized in the presence of a catalyst comprising a chromium compound, an alumoxane and an organometallic alkoxide and/or organometallic siloxide and a carrier supporting thereon these compounds. The resultant polymer has a balanced proportion of rigidity and environmental stress cracking resistance (ESCR) and an excellent moldability property.


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