The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 04, 2000

Filed:

Jun. 04, 1997
Applicant:
Inventor:

Masayasu Suzuki, Kanagawa, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H05H / ; H05H / ; C23C / ; H01J / ;
U.S. Cl.
CPC ...
427571 ; 427575 ; 1187 / ; 1187 / ; 31511141 ;
Abstract

An apparatus for forming thin films such as protective layers on both surfaces of a substrate of a magnetic memory device has an evacuable reaction chamber sandwiched between two electron cyclotron resonance plasma generators disposed on mutually opposite sides. Each plasma generator includes a wave guide for introducing microwave energy and a magnetic coil for providing a magnetic field for generating a plasma and causing the generated plasma to move to the substrate set inside the reaction chamber with a negative bias voltage applied thereto.


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Suzuki, Masayasu. (2000). Method and apparatus for forming thin films using dual ecr plasma (U.S. Patent No. 6010755). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6010755

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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