The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 04, 2000
Filed:
Sep. 30, 1997
Richard Fonda, Alexandria, VA (US);
Roy Vandermeer, Alexandria, VA (US);
Harry Jones, Alexandria, VA (US);
The United States of America as represented by the Secretary of the Navy, Washington, DC (US);
Abstract
The shape memory effect is displayed by near-equiatomic ruthenium alloys of Ta or Nb with compositions of Ta.sub.x Ru.sub.1-x where x can be as low as 0.38 and preferably x=0.44 to 0.63 and Nb.sub.x Ru.sub.1-x where x can be as low as 0.25 and preferably x=0.45 to 0.59 which exhibit a transition from the high-temperature cubic phase to a tetragonal phase. These alloys are prepared by melting together tantalum and ruthenium, or niobium and ruthenium, in the above mentioned ratios. A further embodiment of this invention is to alloy NiTi alloys with, one of these two ruthenium-based high-temperature alloys (i.e. either Ta--Ru or Nb--Ru) so as to obtain a similar behavior which will result in an increase in the transition temperature relative to unalloyed Ni--Ti. Articles having the shape memory effect are prepared by forming the alloy into a desired shape above the transition temperature, or alternatively, imparting the desired shape to the alloy below the transition temperature by machining or other shaping processes, and then deforming the alloy into a different shape at a temperature below the transition temperature.