The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 04, 2000
Filed:
Jan. 26, 1999
Applicant:
Inventors:
Assignee:
Eastman Kodak Company, Rochester, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03D / ; G03D / ;
U.S. Cl.
CPC ...
396612 ; 396626 ; 396627 ;
Abstract
A processing apparatus for processing photosensitive material combines thin channel technology with nozzles, and an inclined processing path. Processing solution can be introduced into the inclined processing path so as to cause the solution to flow along the inclined processing path in a direction which is opposite to a direction of travel of the photosensitive material in the inclined processing path. With the arrangement of the present invention, photosensitive material can be processed in the first processing path by way of the nozzle spray arrangement and can be subjected to further processing along the inclined processing path.