The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 28, 1999

Filed:

Jan. 19, 1999
Applicant:
Inventors:

Mohamad Sabsabi, Boucherville, CA;

Paolo Cielo, Montreal, CA;

Louis St-Onge, Cote St-Luc, CA;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N / ;
U.S. Cl.
CPC ...
356318 ;
Abstract

A method and apparatus is disclosed for enhanced laser-induced plasma spectroscopic analysis of unknown heterogeneous materials. The apparatus has high power pulsed lasers with their beams focused on the material, typically two colinear lasers providing two pulses in the ultraviolet and in the near infrared spectral area. The first laser pulse vaporizes a small volume at the surface of the material and produces a plasma which is subsequently enhanced by the second laser pulse. The optical emission of the plasma is analyzed with a colinear optical spectrometer. The pulsed spectrum is detected by a gated photodiode array detector or by an array of photomultipliers each individually positioned to detect a line emission representative of a given element present in the material. The combination of the two laser pulses, appropriately synchronized, provides a plasma emission that is significantly stronger than a single laser pulse of the combined energy of the two pulses.


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