The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 28, 1999
Filed:
Sep. 29, 1997
Kazuhiro Takahashi, Utsunomiya, JP;
Kazunori Iwamoto, Utsunomiya, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A scanning exposure apparatus includes a light source, an illumination optical system for forming a secondary light source with light from the light source, and for illuminating a portion of a reticle having a pattern, a projection optical system for projecting the pattern of the reticle as illuminated, onto a wafer, a reticle stage for supporting the reticle and for scanningly moving the reticle in a predetermined scan direction, relative to the projection optical system, a wafer stage for supporting the wafer and for scanningly moving the wafer relative to the projection optical system, and a base for supporting the reticle stage and being supported by dampers, wherein the illumination optical system is divided into a first portion being supported by the base and a second portion supported by a floor, independently from the base, and wherein the predetermined direction of the reticle stage is substantially or approximately parallel to an optical axis direction at a location where the illumination optical system is divided.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile