The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 28, 1999
Filed:
Apr. 19, 1995
Applicant:
Inventors:
Zhou Yang, Milford, CT (US);
Yin-Nian Lin, Milford, CT (US);
Zhenya Zhu, Stratford, CT (US);
Brian George Risch, Monroe, CT (US);
Assignee:
Optima, Inc., Stratford, CT (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F / ; C08L / ; C08L / ;
U.S. Cl.
CPC ...
525123 ; 25218217 ; 25218218 ; 2521822 ; 25218223 ; 25218224 ; 25218228 ; 522 62 ; 522 90 ; 522 96 ; 522173 ; 522175 ; 525131 ; 525455 ; 528 52 ; 528 53 ; 528 58 ; 528 68 ; 528 75 ; 528 85 ;
Abstract
A monomer composition characterized by being curable to form a resin suitable for optical products having a balanced refractive index and Abbe's number range and good tintability comprising a polyene monomer; a polyisocyanate, polyisothiocyanate, or an isocyanate monomer containing at least one isothiocyanate group; and a monomer having two or more active hydrogen groups such as polythiols, polyamines, and polyols. The invention also provides a special process for making the composition and for curing the composition to form a resin product.