The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 28, 1999
Filed:
Aug. 07, 1998
Franz Schreieder, Tann, DE;
Hee Young Kim, Taejon, KR;
Wacker-Chemie GmbH, Munich, DE;
Abstract
A process for preparing silicon granules with a chlorine contamination below 50 ppm by weight by deposition of elemental silicon on silicon particles in a fluidized-bed reactor. This reaction has a heating zone below a reaction zone. The silicon particles, in the heating zone, are fluidized by means of an inert silicon-free carrier gas to produce a fluidized bed and are heated by means of microwave energy. The silicon particles are reacted within the reaction zone, a reaction gas made up of a silicon source gas and the carrier gas. The average temperature of the reaction gas in the reaction zone, while the gas is perfusing the fluidized silicon particles, is maintained at less than 900.degree. C. The average temperature of the fluidized silicon particles in the reaction zone, while they are being perfused by the reaction gas, is maintained at greater than 900.degree. C.