The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 21, 1999
Filed:
Nov. 20, 1997
Robert M Mara, Fairport, NY (US);
Barbara A Sampath, Geneseo, NY (US);
Lai C Lam, Webster, NY (US);
Patrick O Waller, Rochester, NY (US);
Joseph A Mastrandrea, Webster, NY (US);
Xerox Corporation, Stamford, CT (US);
Abstract
An apparatus for monitoring and controlling electrical parameter of an imaging surface, the monitoring controlling apparatus including a patch generator for recording a first control patch at a first voltage level and a second control patch at a second voltage level on the imaging surface; electrostatic voltmeter for measuring voltage potentials associated with the first control patch and second control patch. A processor, in communication with the patch generator, calculates the electrical parameters of the imaging surface from the measured voltage potentials from the first and second control patches. The processor determines a deviation between the calculated electrical parameters values and setup values. Then, the processor produces and sends a feedback error signal to the patch generator if the deviation exceed a threshold level. The patch generator records a third control patch at a third voltage level on the imaging surface upon reception of the error signal. The ESV senses the third control patch. The processor calculates the electrical parameters of the imaging surface from the measured voltage potential of the third control patch and determines a correction factor. The charging device, exposure system and developer are adjusted in accordance to the correction factor.