The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 21, 1999
Filed:
Dec. 29, 1997
Nobuyuki Ikoma, Yokohama, JP;
Sumitomo Electric Industries, Ltd., Osaka, JP;
Abstract
The present invention relates to a semiconductor laser equipped with a novel window structure, thereby realizing higher output, and a method of making the same. The method is a method of making a semiconductor laser having a window structure transparent to emitted laser light. In particular, into a laminate structure comprising a semiconductor substrate, a lower cladding layer, an active layer, and an upper cladding layer, impurity atoms is implanted to a predetermined region of the upper cladding layer by ion implantation method, thereby forming an impurity implanted region above the active layer. Further, in this method, after the laminate structure is heat-treated to such an extent that the impurity atom fails to reach the active layer, the laminate structure is cleaved in the area where the impurity atom is implanted, thus yielding a semiconductor laser. As a result of such a heat treatment, the vacancies generated upon ion implantation diffuse into the active layer, whereas the impurity atoms themselves do not diffuse into the active layer. This vacancy diffusion forms, in the vicinity of the cleavage plane in the active layer, a window structure in which a well layer and barrier layers which constitute the quantum well structure are selectively interdiffused. This window structure suppresses the catastrophic optical damage during high output operation.