The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 21, 1999
Filed:
Aug. 03, 1998
Sharp Kabushiki Kaisha, Osaka, JP;
Abstract
A region on a surface side of a sample is irradiated with a Ga ion beam to form a first laminar portion having a thickness of 50-200 nm small enough to allow the transmission electron microscopic observation. While the sample is being heated within a transmission electron microscope, a process in which silicide is being formed is observed at the first laminar portion. Thereafter, a second laminar portion is formed in a thick region of the sample, similarly to the first laminar portion. Then, the first and second laminar portions are comparatively observed in a non-heated state with the transmission electron microscope. If observation results of the two laminar portions in the non-heated state are the same, a result of observing the first laminar portion during the heating is taken to represent a phenomenon in a bulk state. If observation results of the two laminar portions are different from each other, the result of observing the first laminar portion during the heating is taken to represent a unique phenomenon resulting from the heating of the sample in a thin film state. Thus, a transmission electron microscopic observation involving the simultaneous heat treatment is correctly carried out with a few samples.