The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 21, 1999

Filed:

Jul. 21, 1998
Applicant:
Inventors:

Joo-nyung Jang, Yongin, KR;

Kyung-ho Kwack, Yongin, KR;

Bo-hun Choi, Seoul, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430-5 ;
Abstract

An amplitude mask used in a long period grating filter manufacturing apparatus includes a metal substrate having a periodic transmission area having a period for selectively transmitting light and a non-transmission area through which light does not pass; and a piezo-electric transducer located on the non-transmission area of the metal substrate for changing the period of the periodic transmission area. The periodic transmission area is located in the middle of the metal substrate and the piezo-electric transducer is located on opposite sides of the periodic transmission area. Piezo-electric transducers may be located on the non-transmission area to vary the period of the periodic transmission area.


Find Patent Forward Citations

Jang, Joo-nyung. (1999). Amplitude mask and apparatus for manufacturing long period grating (U.S. Patent No. 6004703). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6004703

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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