The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 21, 1999
Filed:
May. 14, 1997
Applicant:
Inventors:
Lee Kevin Dorius, San Jose, CA (US);
Sanford Anthony Bolasna, San Jose, CA (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G11B / ;
U.S. Cl.
CPC ...
216 22 ; 216 41 ; 2960312 ; 2960315 ;
Abstract
A dual etch process for forming an air bearing slider design with three etch depths. For one embodiment the first etch forms the leading and trailing step regions and the second etch forms the lateral step regions. The combination of the first and second etches form the negative pressure region.
Dorius, Lee. (1999). Dual etch step process for making a three etch depth air bearing slider (U.S. Patent No. 6004472). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6004472
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile