The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 14, 1999
Filed:
Jun. 18, 1999
Other;
Abstract
A wavefront aberration measuring device and method is based on the principles of phase contrast interference. A particular application is the two-dimensional representation of the complex optical aberrations of the complete eye optics. This device consists of an illuminating optical part, to project an image of an annular light source on the retina of the eye. This projected image becomes a secondary light source on the retina that transilluminates in reverse the eye optics. Because of imperfections in the eye optics, some phase distortions will be added to the reflected light. In the analyzing part of the device, this reflected light is optically transformed with the help of a phase plate. The resulting interference pattern is visualized with the observational part of the device and further digitally processed in order to display the optical aberrations without the need for an extensive polynomial analysis. An optional fixation device can be added to control the direction of gaze of the eye. Additionally, the instrument can be mounted on a conventional slitlamp or operating microscope.