The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 14, 1999
Filed:
Nov. 17, 1998
Applicant:
Inventors:
Ramesh Krishnamurti, Williamsville, NY (US);
Sandor M Nagy, Grand Island, NY (US);
Habib Hichri, Snyder, NY (US);
Thomas F Smolka, West Seneca, NY (US);
Assignee:
Occidental Chemical Corporation, Dallas, TX (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C08F / ; C08F / ;
U.S. Cl.
CPC ...
526 62 ; 526 74 ; 526344 ;
Abstract
Disclosed is a method of inhibiting the formation of scale on reactor surfaces in contact with a polymerizing vinyl monomer. The reactor surfaces are contacted with a composition that contains, as a scale reducing agent, an acidic hydrazone condensate or a salt thereof. The scale reducing agent can be added to the polymerizing monomer or it can be placed in a composition containing a surfactant and an inorganic binder and the composition can be applied to the reactor surfaces or added to the monomer.