The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 14, 1999
Filed:
Jun. 16, 1998
Scott D Hector, Berkeley, CA (US);
Motorola, Inc., Schaumburg, IL (US);
Abstract
A method of forming a lithographic mask, including exposing an energy beam on a first selected spot (118) on the patterning layer of a mask substrate, within a selected portion (117) on the patterning layer, and exposing an energy beam on a second selected spot (122) on the patterning layer. The selected portion corresponds to a lithographic feature (116) and has a boundary (128) including a plurality of boundary segments defining a polygon. The energy beam is exposed on the first selected spot (118) at a first dosage, and at the second selected spot (122) at a second dosage that does not equal the first dosage. According to the present invention, a lithographic feature (116) is provided on the lithographic mask and includes a serif (126), a portion of which is provided by altering the dosage level at the second selected spot.