The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 14, 1999
Filed:
May. 06, 1998
Shinichiro Kotake, Tokyo, JP;
Kazuaki Kimura, Tokyo, JP;
Eiji Ochi, Tokyo, JP;
Toru Takashina, Hiroshima, JP;
Susumu Okino, Hiroshima, JP;
Mitsubishi Heavy Industries, Ltd., Tokyo, JP;
Abstract
The present invention provides a gas-liquid contact apparatus which can make the equipment more compact and reduce the cost while achieving high gas-liquid contact efficiency. In the apparatus of the present invention, an oxidation tank (2) is installed in proximity to an absorption tower (1), and an absorbing fluid (3) is stored in this oxidation tank (2). The level H of the absorbing fluid (3) is determined so as to be above the position of nozzles (7), whereby the absorbing fluid is spouted upward from the nozzles (7). Flue gas is introduced into the absorption tower (1) from a flue gas inlet section (8) and made to flow upward at a high velocity, so that the peaks of the spouted streams are raised above level H. The absorbing fluid (3) is caught by catcher device (11) installed at a position above level H, and returned to the oxidation tank (2) through a circulation pipe (12). An air pipe (20) is connected to the circulation pipe (12) so as to suck in air.