The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 07, 1999
Filed:
May. 12, 1998
Atsushi Shiozaki, Sohraku-gun, JP;
Koichi Matsuda, Kyotanabe, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
The present invention is to provide a production method for a deposit film comprising: a step of forming a reflecting layer on a substrate by opening a film forming chamber to the atmosphere, reducing the pressure of the film forming chamber, heating the film forming chamber to a temperature higher than a predetermined film forming temperature followed by cooling or self-cooling, and setting the film forming chamber at the predetermined film forming temperature, a step of contacting the reflecting layer surface with active oxygen and/or oxygen ion, and a step of forming a transparent conductive layer. According to the present invention, highly reliable reflecting layer and transparent conductive layer having a high reflectance can be stably obtained with a desired texture structure at a low cost.