The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 07, 1999

Filed:

Sep. 25, 1997
Applicant:
Inventors:

Homare Shinohara, Ibaraki Prefecture, JP;

Masato Kodama, Chiba Prefecture, JP;

Kimio Hamamura, Chiba Prefecture, JP;

Hirofumi Kuroda, Ibaraki Prefecture, JP;

Assignee:

Eisai Chemical Co., Ltd., Ibaraki Prefecture, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07D / ; C07D / ; C07D / ; C07D / ;
U.S. Cl.
CPC ...
540222 ; 540215 ; 540226 ; 540227 ; 540228 ; 540230 ;
Abstract

An industrially excellent, novel process for producing cephem compounds which are useful as medicines, particularly, antibiotics and represented by the following formula (III): ##STR1## wherein R.sup.1 means either group represented by the following formula: ##STR2## R.sup.2 denotes a carboxyl group or a carboxyl anion, and R.sup.3 stands for a lower alkyl group, a halogen atom, a lower alkyl group substituted by an aliphatic acyloxy group having 1-6 carbon atoms, or any one of the groups represented by the following formulae: ##STR3## which comprises reacting in water a 3-cephem-4-carboxylate represented by the following formula (I): ##STR4## or a salt thereof with an acid chloride represented by the formula (II), R.sup.1 COCl.


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