The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 07, 1999
Filed:
Apr. 02, 1998
Victer Chan, San Jose, CA (US);
LSI Logic Corporation, Milpitas, CA (US);
Abstract
The system and method of the present invention enable the effective and efficient determination of the misalignment between openings located in the contact layer and the interconnect layer, respectively. In this way, defective semiconductors produced in semiconductor wafer fabrication can be readily identified and segregated for shipment to customers. A single multifunctional structure formed in the contact layer can be used to determine the alignment accuracy of the contact layer and the interconnect layer by (a) inline visual inspection and (b) determination of the end of line electrical resistance properties of the semiconductor wafer. Hence the use of the multi-functional aspects of this invention eliminates the correlation issues with the structure.