The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 07, 1999

Filed:

Jul. 01, 1997
Applicant:
Inventors:

Seiji Umemoto, Osaka, JP;

Yasuo Fujimura, Osaka, JP;

Kazutaka Hara, Osaka, JP;

Suguru Yamamoto, Osaka, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ; G03C / ; G02B / ; C08F / ;
U.S. Cl.
CPC ...
4302811 ; 4302861 ; 430290 ; 522-2 ; 522120 ; 522144 ; 522182 ; 359642 ; 359652 ;
Abstract

A process for producing a polymer or a crosslinked article having a region in which the polymerization rate or crosslinking rate is varied is disclosed, comprising irradiating a photopolymerizable substance or photo-crosslinkable substance with laser light having an uneven distribution of intensity. The process is suitable for mass production of polymerization rate- or crosslinking rate-distributed articles. An arbitrary distribution pattern can be designed and formed under good control, and distribution regions having a fine shape can be formed with excellent precision. A plurality of distribution regions having a regular shape can be formed at a high density with high precision.


Find Patent Forward Citations

Loading…