The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 07, 1999
Filed:
Jan. 27, 1998
Koji Matsuoka, Kanagawa, JP;
Matsushita Electric Industrial Co., Ltd., Osaka, JP;
Abstract
A reticle has a phase-shifting pattern region, a normal pattern (chrome pattern) region, and a shielding region. The phase-shifting pattern region has first and second apertures and mask portions located therebetween. The first apertures transmit light opposite in phase to light transmitted by the second apertures. The normal pattern region has apertures and mask portions. The semiconductor chip regions of a resist film formed on a wafer are exposed stepwise through the phase-shifting pattern region. Subsequently, the portions of the semiconductor chip regions exposed through the phase-shifting pattern region are exposed through the normal pattern region.