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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 5997948 B1

PDFFull Text
Date of Patent:
Dec. 07, 1999

Filed:

Nov. 28, 1994

Process for producing a deposit comprising silica on the surface of a

Applicant:
Inventors:

Sami Dick, Le Chesnay, FR;

Bernard Genies, Bures sur Yvette, FR;

Lahcen Ougarane, Montigny le Bretonneux, FR;

Patrick Recourt, Marcoussis, FR;

Assignee:

L'Air Liquide, Societe Anonyme pour l'Etude et l'Exploitation des, , US;

Attorney:

Young & Thompson

Primary Examiner:

Shrive Beck

Assistant Examiner:

Brett Chen

Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
42725511 ; 42725518 ; 42725537 ; 4272555 ;
Abstract

A deposit of a silica base layer is formed on the surface of a glass product by projecting on a hot surface of the product, in a non confined ambient atmosphere, a gaseous mixture having a silane content lower than 2%, an oxygen content between 3.5 and 30%, and advantageously a hydrogen content lower than 5%. The surface of the object to be treated is advantageously heated immediately before being sent to the injection station.

Find Patent Forward Citations

Dick, Sami. (1999). Process for producing a deposit comprising silica on the surface of a (U.S. Patent No. 5997948). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5997948

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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