The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 07, 1999
Filed:
Sep. 18, 1997
Applicant:
Inventors:
Tetsuya Mino, Chiba, JP;
Yasufumi Uno, Nagano, JP;
Assignee:
TDK Corporation, Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C / ; C23C / ;
U.S. Cl.
CPC ...
2041922 ; 20419212 ; 20419215 ;
Abstract
An Fe--Zr--N base thin film composed of a metal nitride is formed by reactive sputtering. At the reactive sputtering step, the stress of the thin film is controlled by causing relative movement of the substrate with respect to a target in such a manner that the substrate can be periodically opposite to the target, or applying a negative bias voltage to the substrate, or performing said relative movement of the substrate with the application of the negative bias voltage to the substrate.