The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 07, 1999
Filed:
Jul. 09, 1996
Navin Gautam, Midlothian, VA (US);
Harry V Lanzillotti, Midlothian, VA (US);
Tyrone W Murray, Midlothian, VA (US);
D Anh Phan, Richmond, VA (US);
Jon R Butt, Sr, Woodstock, GA (US);
H Edmund Clark, Cumming, GA (US);
Thomas E Dougherty, Milltown, NJ (US);
Thomas L Fillio, Chamblee, GA (US);
Vladimir Hampl, Jr, Rosewell, GA (US);
Phillip L Ursery, Roswell, GA (US);
Edwin L Cutright, Powhatan, VA (US);
Ronald L Edwards, Richmond, VA (US);
Philip Morris Incorporated, New York, NY (US);
Abstract
A method and apparatus of manufacturing a web which is striped with add-on material, comprising: a first arrangement which establishes a sheet of base web from a first slurry and moves the established sheet along a first path; a second arrangement for preparing a second slurry; a moving orifice applicator operative so as to repetitively discharge the second slurry upon the moving sheet of base web, the moving orifice applicator comprising: a chamber box arranged to establish a reservoir of the second slurry across the first path; an endless belt having an orifice, the endless belt received through the chamber box; a drive arrangement operative upon the endless belt to continuously move the orifice along an endless path and repetitively through the chamber box, the orifice when communicated with the reservoir being operative to discharge the second slurry from the reservoir through the orifice; a flow distribution system for introducing the second slurry into the chamber box at spaced-apart feed locations along the chamber box; a flow monitoring system for reading fluid pressure at spaced-apart locations along the chamber box; and a controller arranged to identify which of the feed ports is operatively adjacent a monitored location of highest pressure variation, the controller selectively adjusting output of the flow distribution system at the identified feed location counteractively to the highest pressure variation, the controller adjusting output of a remainder of the feed locations counteractively to the output adjustment at the identified feed location.