The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 07, 1999

Filed:

Nov. 18, 1996
Applicant:
Inventors:

Hiroji Sagara, Tokyo, JP;

Yoichi Hachitani, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J / ;
U.S. Cl.
CPC ...
445 24 ;
Abstract

The process for the production of a spacered substrate for use in a self-emitting display, provided by the present invention, comprises the steps of exposing a photosensitive glass to light while masking a portion to form a spacer on a surface of the photosensitive glass, to form a latent image corresponding to an exposed portion, crystallizing the exposed portion having the latent image, removing a crystallized exposed portion by an etching treatment, and thereby forming a spacer of non-exposed photosensitive glass on a glass substrate. According to the present invention, there is provided a spacered substrate for use in a self-emitting display, in which the spacer has high accuracy and high heat resistance and the roughening of the substrate surface is not easily caused.


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