The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 07, 1999
Filed:
Jun. 26, 1998
Applicant:
Inventors:
Hiroshi Tsujikawa, Hiroshima, JP;
Koji Shinobudani, Hiroshima, JP;
Yosiki Ogata, Hiroshima, JP;
Takashi Iwamoto, Hokkaido, JP;
Shinichi Ono, Hokkaido, JP;
Hideo Iwasawa, Hokkaido, JP;
Assignee:
The Japan Steel Works, Ltd., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
B21D / ; B21D / ;
U.S. Cl.
CPC ...
72340 ; 72335 ; 723421 ; 72358 ;
Abstract
In accordance with the present invention, the method of manufacturing a vacuum chamber which is used as a cluster tool, a vacuum film-forming apparatus, or the like of a manufacturing apparatus used for semiconductors, liquid crystals, solar cells, and the like, and which is formed by a vessel in which an opening (4A) is provided at one surface for forming a cover, and a hole (4) smaller than the opening (4A) is provided in an opposite surface to the opening (4A), includes the steps of: