The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 07, 1999
Filed:
Mar. 18, 1998
Applicant:
Inventor:
Peter S Knapen, Eindhoven, NL;
Assignee:
U.S. Philips Corporation, New York, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11B / ; G11B / ; B44C / ; B05D / ;
U.S. Cl.
CPC ...
2960307 ; 4271261 ; 4271263 ; 4271264 ; 4271265 ; 427127 ; 4272071 ; 427307 ; 216 58 ; 216 76 ; 216 79 ; 216 95 ; 216102 ; 2960301 ; 2960317 ; 2960318 ; 2960319 ; 296032 ; 360125 ; 360126 ;
Abstract
Method of manufacturing a multilayer structure, in which method gold is deposited on a basic layer (3, 11) for forming a gold layer (7, 13), whereafter aluminium oxide is deposited on the gold layer for forming an aluminium oxide layer (9, 15). Silicon oxide is deposited on the aluminium oxide layer by means of PE-CVD for forming a silicon oxide layer (11, 13), and the aluminium oxide layer constitutes an adhesive layer between the gold layer and the silicon oxide layer. Together with the aluminium oxide layer, the silicon oxide layer constitutes an insulating and/or protective cladding layer for the gold layer.