The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 07, 1999

Filed:

Jul. 24, 1998
Applicant:
Inventors:

Sidney C Chao, Manhattan Beach, CA (US);

Robert W Beach, Redondo Beach, CA (US);

Nelson W Sorbo, Redondo Beach, CA (US);

Edna M Purer, Los Angeles, CA (US);

Assignee:

Raytheon Company, Lexington, MA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
D06F / ;
U.S. Cl.
CPC ...
8158 ; 8159 ; 68 1 / ; 68 1 / ;
Abstract

A process is provided for cleaning, disinfecting, and sterilizing substrates comprising the steps of: (a) placing the contaminated substrate in a cleaning vessel; (b) contacting the contaminated substrate with dense phase carbon dioxide in liquid form; (c) subjecting the substrate and the dense phase carbon dioxide to ultraviolet radiation having a wavelength within the range of about 180 to 300 nm for a duration and intensity sufficient to produce a photochemical reaction capable of destroying the DNA of microorganisms on the substrate; (d) substantially simultaneously subjecting at least the dense phase carbon dioxide to agitation; and (e) removing the dense phase carbon dioxide from the cleaning vessel and thereby transporting the contaminants from the substrate such that the substrate is cleaned and, in the case of contaminated garments, disinfected or, in the case of medical and dental instrumentation, sterilized. Substantially simultaneously with the UV exposure and agitation, the substrates are also subjected to an oxidizing sterilant, such as H.sub.2 O.sub.2.


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