The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 30, 1999

Filed:

Aug. 13, 1997
Applicant:
Inventors:

Chinchuan Chiu, New City, NY (US);

Toru Oki, Allendale, NJ (US);

Philip Paolella, Fort Lee, NJ (US);

Assignees:

Sony Corporation, Tokyo, JP;

Sony Corp. of America, New York, NY (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06K / ;
U.S. Cl.
CPC ...
382159 ; 382181 ;
Abstract

A pattern searching method using neural networks and correlation. This method combines the quickness and adaptiveness of neural networks with the accuracy of the mathematical correlation approach. Images are divided into small sub-images which are presented to the trained neural network. Sub-images that may contain the pattern or partial pattern are selected by the neural network. The neural network also provides the approximate location of the pattern, therefore the selected sub-images can be adjusted to contain the complete pattern. Desired patterns can be located by measuring the new sub-images' correlation values against the reference models in a small area. Experiments show that this superior method is able to find the desired patterns. Moreover, this method is much faster than traditional pattern searching methods which use only correlation.


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