The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 30, 1999

Filed:

Nov. 06, 1998
Applicant:
Inventors:

Guang-Yao Yan, Mountain View, CA (US);

John C Tsai, Saratoga, CA (US);

Assignee:

Excel Precision, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01S / ;
U.S. Cl.
CPC ...
372 37 ; 372105 ; 372 10 ;
Abstract

The present invention is a laser (12) having a resonator (28) between an output coupling mirror (20) and a high-reflection mirror (26). A photoelastic plate (38) is incorporated in a photoelastic cell (24), or a photoelastic mirror (36) used in place of the high-reflection mirror (26). The photoelastic plate (38) is placed in the resonator (28) and introduces an artificial anisotropy to the laser (12). The photoelastic plate (38) has privileged directions (34), which are aligned with the axes of the artificial anisotropy. A magnetic field (32) is applied transversely to the resonator (28), in alignment with one of the privileged directions (34), to produce two orthogonal linearly polarized frequencies in an output beam (30) with the Zeeman effect.


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