The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 30, 1999

Filed:

Sep. 04, 1997
Applicant:
Inventor:

Koji Matsuoka, Hirakata, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430-5 ;
Abstract

A resist pattern is formed with a phase-shifting mask 4 in which transparent regions through an opaque region are different 180.degree. in phase from one another. In this case, when positive resist 1 is subjected to exposure, the widths of the opaque regions 5A and 5B of the mask 4 are changed according to a pattern adjacent thereto, so that a fine pattern having the same line width is formed with high accuracy.


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