The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 30, 1999

Filed:

Jan. 05, 1998
Applicant:
Inventors:

Kenji Ueda, Tokyo, JP;

Shingo Nishikawa, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B / ;
U.S. Cl.
CPC ...
1563798 ; 156249 ; 1562728 ; 1563735 ; 359 12 ; 359 14 ; 359 35 ;
Abstract

A system which enables a film, e.g. a photosensitive material film, to be continuously laminated on and delaminated from a surface of a substrate, e.g. a hologram original plate, and allows duplication to be continuously effected. The system includes a film supply part (32) for supplying a film (1), a film laminating part (37) for continuously laminating the supplied film (1) on a film laminating substrate (35), a film delaminating part (37') for continuously delaminating the film from the substrate (35), and a film take-up part (43) for taking up the delaminated film. In the system, no air bubbles are trapped when the film (1) is laminated on the substrate (35), and no peel unevenness, e.g. undesired line, occurs when the film (1) is delaminated from the substrate (35). The system is suitable for use in a hologram duplicating apparatus, a dimple relief pattern duplicating apparatus, a microscopic test sample preparing apparatus, etc.


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