The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 23, 1999
Filed:
Jul. 21, 1997
Nob Kimura, Torrance, CA (US);
Daniel Wu, Cerritos, CA (US);
Discovision Associates, Irvine, CA (US);
Abstract
The present invention includes a method and apparatus for reducing the width of a mark written in optical media. When forming a long mark, the prior art recording methods typically cause blooming at the edges of the mark, resulting in a wide mark pattern which may be sensed by the read focused spot reading an adjacent track causing increased adjacent track crosstalk (ATC). However, by removing every other pulse from the write pulse waveform, the cooling sequence of the writing process is sufficiently increased to allow for additional cooling between pulses. When forming marks with less pulses, the effects of blooming are substantially reduced. Thus, because of the reduction in the effect of blooming, the problems associated with ATC, whereby adjacent track information is recorded, is substantially reduced.